Please note that eDoc will be permanently shut down in the first quarter of 2021!      Home News About Us Contact Contributors Disclaimer Privacy Policy Help FAQ

Home
Search
Quick Search
Advanced
Fulltext
Browse
Collections
Persons
My eDoc
Session History
Login
Name:
Password:
Documentation
Help
Support Wiki
Direct access to
document ID:


          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Ehemalige Abt. Rühle (Microstructure and Interfaces)     Display Documents



ID: 198720.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Ehemalige Abt. Rühle (Microstructure and Interfaces)
Reduced critical thickness and photoluminescence line splitting in multiple layers of self-assembled Ge/Si islands
Authors:Schmidt, O. G.; Eberl, K.; Kienzle, O.; Ernst, F.; Christiansen, S.; Strunk, H. P.
Language:English
Date of Publication (YYYY-MM-DD):2000
Title of Journal:Materials Science and Engineering B
Volume:74
Start Page:248
End Page:252
Review Status:Peer-review
Audience:Experts Only
Intended Educational Use:No
External Publication Status:published
Document Type:Article
Communicated by:Fritz Phillipp
Affiliations:MPI für Metallforschung/Abt. Rühle
The scope and number of records on eDoc is subject to the collection policies defined by each institute - see "info" button in the collection browse view.