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          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Abt. Dosch/Rühle (Metastable and Low-dimensional Materials)     Display Documents



  history
ID: 210842.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Abt. Dosch/Rühle (Metastable and Low-dimensional Materials)
Strongly enhanced thermal stability of crystalline organic thin films induced by aluminum oxide capping layers
Authors:Sellner, S.; Gerlach, A.; Schreiber, F.; Kelsch, M.; Kasper, N.; Dosch, H.; Meyer, S.; Pflaum, J.; Fischer, M.; Gompf, B.
Language:English
Date of Publication (YYYY-MM-DD):2004-10
Title of Journal:Advanced Materials
Volume:16
Issue / Number:19
Start Page:1750
End Page:1753
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:Peter Wochner
Affiliations:MPI für Metallforschung/Abt. Dosch/ZWE MF-ANKA-Beamline
MPI für Metallforschung/Abt. Rühle/ZWE Hochspannungs-Mikroskopie
External Affiliations:Physical and Theoretical Chemistry Laboratory, Oxford University, GB-Oxford OX1 3QZ;
III. Physikalisches Institut, Universität Stuttgart, D-70550 Stuttgart;
I. Physikalisches Institut, Universität Stuttgart, D-70550 Stuttgart
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