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          Institute: MPI für Plasmaphysik     Collection: Articles, Books, Inbooks     Display Documents



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ID: 214409.0, MPI für Plasmaphysik / Articles, Books, Inbooks
Metal-doped carbon films obtained by magnetron sputtering
Authors:Balden, M.; Cieciwa, B.; Quintana, I.; de Juan Pardo, E.; Koch, F.; Sikora, M.; Dubiel, B.
Language:English
Research Context:9th International Conference on Plasma Surface Engineering (PSE 2004), Garmisch-Partenkirchen, 2004-09-13 to 2004-09-17
Date of Publication (YYYY-MM-DD):2005
Title of Journal:Surface and Coatings Technology
Volume:200
Start Page:413
End Page:417
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Plasmaphysik/Materialforschung
External Affiliations:AGH University of Science and Technology, Al. Mickiewicza 30, 30-059 Krakow, Poland
Identifiers:URL:http://dx.doi.org/10.1016/j.surfcoat.2005.02.218
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