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          Institute: MPI für Mikrostrukturphysik     Collection: Publikationen des MPI-MSP     Display Documents



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ID: 223850.0, MPI für Mikrostrukturphysik / Publikationen des MPI-MSP
Modeling of Si self-diffusion in SiO2: Effect of the Si/SiO2 interface including time-dependent diffusivity
Authors:Uematsu, M.; Kageshima, H.; Takahshi, Y.; Fukatsu, S.; Itoh, K.M.; Shiraishi, K.; Gösele, U.
Date of Publication (YYYY-MM-DD):2004
Title of Journal:Applied Physics Letters.
Volume:84
Issue / Number:6
Start Page:876
End Page:878
Review Status:not specified
Audience:Not Specified
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Mikrostrukturphysik
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