Please note that eDoc will be permanently shut down in the first quarter of 2021!      Home News About Us Contact Contributors Disclaimer Privacy Policy Help FAQ

Home
Search
Quick Search
Advanced
Fulltext
Browse
Collections
Persons
My eDoc
Session History
Login
Name:
Password:
Documentation
Help
Support Wiki
Direct access to
document ID:


          Institute: MPI für Eisenforschung GmbH     Collection: Interface Chemistry and Surface Engineering     Display Documents



  history
ID: 225226.0, MPI für Eisenforschung GmbH / Interface Chemistry and Surface Engineering
High temperature chemical vapour deposition of silicon on Fe(100)
Authors:Rebhan, M.; Meier, R.; Plagge, A.; Rohwerder, M.; Stratmann, M.
Date of Publication (YYYY-MM-DD):2001
Title of Journal:Applied Surface Science
Volume:178
Start Page:194
End Page:200
Sequence Number of Article:1-4
Review Status:not specified
Audience:Popular
External Publication Status:published
Document Type:Article
Affiliations:MPI für Eisenforschung GmbH
The scope and number of records on eDoc is subject to the collection policies defined by each institute - see "info" button in the collection browse view.