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          Institute: MPI für Plasmaphysik     Collection: Articles, Books, Inbooks     Display Documents



  history
ID: 255668.0, MPI für Plasmaphysik / Articles, Books, Inbooks
Growth of copper and vanadium on a thin Al2O3-film on Ni3Al(111)
Authors:Wiltner, A.; Rosenhahn, A.; Schneider, J.; Becker, C.; Pervan, P.; Milun, M.; Kralj, M.; Wandelt, K.
Language:English
Date of Publication (YYYY-MM-DD):2001
Title of Journal:Thin Solid Films
Volume:400
Start Page:71
End Page:75
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Plasmaphysik/Materialforschung
External Affiliations:Institut für Physikalische und Theoretische Chemie, Universität Bonn, Wegelerstr. 12, D-53115 Bonn, Germany; Institute of Physics, University of Zagreb, Bijenicka c.46, P.O. Box 304, 10 000 Zagreb, Croatia
Identifiers:URL:http://www.sciencedirect.com/science/journal/00406...
ISSN:0040-6090
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