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          Institute: MPI für Mikrostrukturphysik     Collection: Publikationen 2005     Display Documents



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ID: 275289.0, MPI für Mikrostrukturphysik / Publikationen 2005
SOI planar photonic crystal fabrication: Etching through SiO2/Si/SiO2 layer systems using fluorocarbon plasmas
Authors:Milenin, A.P.; Jamois, C.; Geppert, T.M.; G”ösele, U.; Wehrspohn, R.B.
Date of Publication (YYYY-MM-DD):2005
Title of Journal:Microelectronic Engineering
Volume:81
Issue / Number:1
Start Page:15
End Page:21
Review Status:not specified
Audience:Not Specified
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Mikrostrukturphysik
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