Home News About Us Contact Contributors Disclaimer Privacy Policy Help FAQ

Home
Search
Quick Search
Advanced
Fulltext
Browse
Collections
Persons
My eDoc
Session History
Login
Name:
Password:
Documentation
Help
Support Wiki
Direct access to
document ID:


          Institute: MPI für Mikrostrukturphysik     Collection: Publikationen 2005     Display Documents



  history
ID: 275290.0, MPI für Mikrostrukturphysik / Publikationen 2005
The SOI planar photonic crystal fabrication: Patterning of Cr using Cl2/O2 plasma etching
Authors:Milenin, A.P.; Jamois, C.; Wehrspohn, R.B.; Reiche, M.
Date of Publication (YYYY-MM-DD):2005
Title of Journal:Microelectronic Engineering.
Volume:77
Issue / Number:2
Start Page:139
End Page:143
Review Status:not specified
Audience:Not Specified
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Mikrostrukturphysik
The scope and number of records on eDoc is subject to the collection policies defined by each institute - see "info" button in the collection browse view.