Home News About Us Contact Contributors Disclaimer Privacy Policy Help FAQ

Home
Search
Quick Search
Advanced
Fulltext
Browse
Collections
Persons
My eDoc
Session History
Login
Name:
Password:
Documentation
Help
Support Wiki
Direct access to
document ID:


          Institute: MPI für Mikrostrukturphysik     Collection: Publikationen 2005     Display Documents



  history
ID: 275360.0, MPI für Mikrostrukturphysik / Publikationen 2005
Capabilities of an ambient pressure plasma for activation in LT wafer bonding processes
Authors:Gabriel, M.; Cetin, V.; Hansen, S.; Reiche, M.; Radu, I.; Eichler, M.
Publisher:The Electrochemical Society
Place of Publication:Pennington, USA
Date of Publication (YYYY-MM-DD):2005
Title of Proceedings:Proceedings of the International Symposium Semiconductor Wafer Bonding VIII, Science and Technology, and Applications
Start Page:50
End Page:57
Title of Series:Proceedings volume / Electrochemical Society
Volume (in Series):2005-02
Review Status:not specified
Audience:Not Specified
External Publication Status:published
Document Type:Conference-Paper
Communicated by:N. N.
Affiliations:MPI für Mikrostrukturphysik
The scope and number of records on eDoc is subject to the collection policies defined by each institute - see "info" button in the collection browse view.