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          Institute: MPI für Polymerforschung     Collection: MPI Polymerforschung     Display Documents

ID: 28517.0, MPI für Polymerforschung / MPI Polymerforschung
Base-pair mapping by chemical force microscopy on nucleobase self-assembled monolayers
Authors:Ijiro, K.; Sunami, H.; Arai, K.; Matsumoto, J.; Karthaus, O.; Kraemer, S.; Mittler, Silvia; Nishi, N.; Juskowiak, B.; Takenaka, S.; Knoll, Wolfgang; Shimomura, M.
Date of Publication (YYYY-MM-DD):2002-02-18
Title of Journal:Colloids and Surfaces A-Physicochemical and Engineering Aspects
Journal Abbrev.:Colloid Surf. A-Physicochem. Eng. Asp.
Start Page:677
End Page:682
Review Status:No review
Audience:Not Specified
Abstract / Description:Self-assembled monolayers (SAMs) of double-chain disulfide derivatives of nucleobases (adenine and thymine) were formed on Au substrates in order to measure complementary hydrogen bonding by chemical force microscopy at the interfaces. Surface plasmon resonance measurements indicated that the formation of the nucleobase SAMs on Au surface was completed within 80 min. To measure adhesion force by atomic force microscopy (AFM), Au- coated AFM tips were modified with the nucleobase SAMs, too. SAM-modified An substrates micro-patterned on quartz substrates were prepared for adhesion force mapping. The adhesion force between the complementary nucleobases is larger than that of the non-complementary combination. Electrochemical detection using a redox-intercalator was demonstrated for hybridization of single-stranded polynucleic acid with the nucleobase SAMs modified on Au electrodes. (C) 2002 Elsevier Science B.V. All rights reserved.
Free Keywords:self-assembled monolayer; nucleic acid base; chemical force mapping; base pair; hydrogen bond
Comment of the Author/Creator:Date: 2002, FEB 18
External Publication Status:published
Document Type:Article
Affiliations:MPI für Polymerforschung
External Affiliations:Hokkaido Univ, Res Inst Elect Sci, Kita Ku, N12W 6, Sapporo, Hokkaido 0600812, Japan; Hokkaido Univ, Grad Sch Environm Earth Sci, Kita Ku, Sapporo, Hokkaido 0600812, Japan; Kyushu Univ, Dept Chem Syst & Engn, Higashi Ku, Fukuoka 8128581, Japan
Identifiers:ISI:000174495800081 [ID No:1]
ISSN:0927-7757 [ID No:2]
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