ID:
289028.0,
MPI für Eisenforschung GmbH / Interface Chemistry and Surface Engineering |
Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP |
Authors: | Ein-Eli, Y.; Abelev, E.; Smith, A. J.; Hassel, A. W. |
Name of Conference/Meeting: | 6th International Symposium on Electrochemical Micro & Nanosystem Technologies |
Place of Conference/Meeting: | Bonn, Germany |
(Start) Date of Conference/Meeting (YYYY-MM-DD): | 2006-08-22 |
End Date of Conference/Meeting (YYYY-MM-DD): | 2006-08-25 |
Document Type: | Talk at Event |
Affiliations: | MPI für Eisenforschung GmbH
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