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          Institute: MPI für Eisenforschung GmbH     Collection: Interface Chemistry and Surface Engineering     Display Documents



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ID: 289028.0, MPI für Eisenforschung GmbH / Interface Chemistry and Surface Engineering
Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP
Authors:Ein-Eli, Y.; Abelev, E.; Smith, A. J.; Hassel, A. W.
Name of Conference/Meeting:6th International Symposium on Electrochemical Micro & Nanosystem Technologies
Place of Conference/Meeting:Bonn, Germany
(Start) Date of Conference/Meeting
 (YYYY-MM-DD):
2006-08-22
End Date of Conference/Meeting 
 (YYYY-MM-DD):
2006-08-25
Document Type:Talk at Event
Affiliations:MPI für Eisenforschung GmbH
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