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          Institute: MPI für extraterrestrische Physik     Collection: High Energy Astrophysics at MPE     Display Documents



ID: 289826.0, MPI für extraterrestrische Physik / High Energy Astrophysics at MPE
Development of a metrology to characterize EUV optics at 13.5nm
Authors:Vongehr, Monika; Predehl, Peter; Hasinger, Günther
Language:English
Publisher:The International Society for Optical Engineering
Place of Publication:Bellingham, Wash., USA
Date of Publication (YYYY-MM-DD):2006-10
Title of Proceedings:Photon Management II
Start Page:618709-1
End Page:618709-9
Title of Series:SPIE Proceedings Series
Volume (in Series):6187
Name of Conference/Meeting:Photon Management II
Place of Conference/Meeting:Strasbourg, France
(Start) Date of Conference/Meeting
 (YYYY-MM-DD):
2006-04-03
End Date of Conference/Meeting 
 (YYYY-MM-DD):
2006-04-04
Review Status:not specified
Audience:Experts Only
External Publication Status:published
Document Type:Conference-Paper
Communicated by:N. N.
Affiliations:MPI für extraterrestrische Physik
Identifiers:ISBN:0-8194-6243-8
DOI:10.1117/12.662816
LOCALID:PH 50/160, p.618709-1-9
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