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          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Abt. Dosch/Rühle (Metastable and Low-dimensional Materials)     Display Documents



  history
ID: 298746.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Abt. Dosch/Rühle (Metastable and Low-dimensional Materials)
Growth of epitaxial Pr2O3 layers on Si(111)
Authors:Jeutter, N. M; Hennemeyer, M.; Stark, R.; Stierle, A.; Moritz, W.
Language:English
Date of Publication (YYYY-MM-DD):2006
Title of Journal:Materials Science in Semiconductor Processing
Volume:9
Start Page:1079
End Page:1083
Review Status:not specified
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:Peter Wochner
Affiliations:MPI für Metallforschung/Abt. Dosch
External Affiliations:Department of Earth and Environmental Sciences, Universität München, 80333 München, Germany
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