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          Institute: Fritz-Haber-Institut     Collection: Chemical Physics     Display Documents



  history
ID: 330180.0, Fritz-Haber-Institut / Chemical Physics
Growth of stoichiometric subnanometer silica films
Authors:Stacchiola, Dario J.; Baron, Martin; Kaya, Sarp; Weissenrieder, Jonas; Shaikhutdinov, Shamil; Freund, Hans-Joachim
Language:English
Date of Publication (YYYY-MM-DD):2008
Title of Journal:Applied Physics Letters
Journal Abbrev.:Appl. Phys. Lett.
Volume:92
Issue / Number:1
Start Page:011911-1
End Page:011911-3
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:Hans-Joachim Freund
Affiliations:Fritz-Haber-Institut/Chemical Physics/Structure and Reactivity
Fritz-Haber-Institut/Chemical Physics/Chemical Physics
Identifiers:URL:http://dx.doi.org/10.1063/1.2824842 [only for subscriber]
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