| ID:
372672.0,
MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Stuttgart Center for Electron Microscopy: StEM |
| Application of monochromated electrons in EELS |
| Authors: | Sigle, W.; Gu, L.; Koch, C.; Srot, V.; Nelayah, J.; van Aken, P. A. |
| Language: | English |
| Date of Publication (YYYY-MM-DD): | 2008 |
| Title of Journal: | Microscopy and Microanalysis |
| Volume (in Journal): | 14 |
| Issue / Number: | Supplement S2 |
| Start Page: | 134 |
| End Page: | 135 |
| Name of Conference/Meeting: | Microscopy and Microanalysis 2008. Microscopy Society of America, 66th Annual Meeting. Microbeam Analysis Society, 42nd Annual Meeting. International Metallographic Society, 41st Annual Meeting |
| Place of Conference/Meeting: | Albuquerque, New Mexico, USA |
(Start) Date of Conference/Meeting
(YYYY-MM-DD): | 2008-08-03 |
End Date of Conference/Meeting
(YYYY-MM-DD): | 2008-08-07 |
| Review Status: | not specified |
| Audience: | Experts Only |
| External Publication Status: | published |
| Document Type: | Conference-Paper |
| Communicated by: | Fritz Phillipp |
| Affiliations: | MPI für Intelligente Systeme/Stuttgart Center for Electron Microscopy (StEM)
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