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          Institute: Fritz-Haber-Institut     Collection: Physical Chemistry     Display Documents



ID: 430369.0, Fritz-Haber-Institut / Physical Chemistry
Atomic structure of Si surfaces etched in Triton/NaOH solutions
Authors:Allongue, Philippe; Kieling, Virginia; Gerischer, Heinz
Language:English
Date of Publication (YYYY-MM-DD):1995-06-08
Title of Journal:Journal of Physical Chemistry
Journal Abbrev.:J. Phys. Chem.
Volume:99
Issue / Number:23
Start Page:9472
End Page:9478
Copyright:© 1995 American Chemical Society
Review Status:Peer-review
Audience:Experts Only
Abstract / Description:In situ real-time scanning tunneling microscopy is used to study Si etching in alkaline solutions modified by addition of Triton, a commonly used nonionic surfactant. On Si(111), time sequences of images, with the resolution of atomic steps, show that the rate of the nucleation of etch pits is decreased on terraces which reducees the etch rate. Results are interpreted in term of formation of a self-assembled micellar layer of Triton molecules whose disorder in the vicinity of atomic scale defects improves surface order compared to etching in NaOH. This layer being not bound to the surface, the (1 × 1)-H-terminated Si(111) surface is always imaged at high resolution. Potential applications of Triton solutions to the preparation of flat surfaces of Si(111) and (100) are discussed.
Free Keywords:crystalline silicon; alkaline-solutions; NaOH solutions; dissolution; orientation; n-Si(111); mechanism; water
External Publication Status:published
Document Type:Article
Communicated by:Martin Wolf
Affiliations:Fritz-Haber-Institut/Physical Chemistry
External Affiliations:Allongue P, Univ Paris, CNRS, UPR 15, 4 Place Jussieu, Tour 22, F-75005 Paris, France; Kieling V, Univ Fed Rio Grande Sul, LACOR, Av. Osvaldo Aranha 99, 7 ° andar, BR-90000 Porto Alegre, RS, Brazil
Identifiers:URL:http://pubs.acs.org/doi/abs/10.1021/j100023a026
DOI:10.1021/j100023a026
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