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          Institute: Fritz-Haber-Institut     Collection: Physical Chemistry     Display Documents

ID: 435413.0, Fritz-Haber-Institut / Physical Chemistry
Morphology of RuO2(110) oxide films on Ru(0001) studied by scanning tunneling microscopy
Authors:Kim, Sang-Hoon; Wintterlin, Joost
Date of Publication (YYYY-MM-DD):2009-08-14
Title of Journal:Journal of Chemical Physics
Journal Abbrev.:J. Chem. Phys.
Issue / Number:6
Start Page:064705–1
End Page:064705–6
Copyright:© 2009 American Institute of Physics
Review Status:Peer-review
Audience:Experts Only
Abstract / Description:Using scanning tunneling microscopy we have investigated the morphology of RuO2(110) films grown on Ru(0001). The films were prepared by dosing 2×105 to 1×106 L of O2 at temperatures between 650 and 850 K. It was found that the films are between 2 and 5 RuO2(110) layers thick, largely independent of the growth conditions. Within the temperature range investigated the perfectness of the films varied significantly. The morphology can be understood according to the habit of RuO2 single crystals, namely, the formation of extended (110), (100), and (101) surfaces. Upon annealing the films decompose by the formation of holes that go down to the metal substrate rather than in a layer-by-layer fashion. The Ru atoms released during decomposition form terraces with shapes similar to the terraces obtained by homoepitaxial metal-on-metal growth. Under the oxidation conditions used, we have not observed suboxides RuOx or the O–Ru–O trilayer that had been postulated to play a role for the RuO2 formation. The partially covered surfaces exclusively showed RuO2 and the known phases of adsorbed O atoms on the metallic Ru.
Free Keywords:adsorbed layers; annealing; crystal morphology; epitaxial growth; oxygen; ruthenium compounds; scanning tunnelling microscopy; thin films
KeyWords Plus: ruthenium dioxide; atomic-scale; STM images; oxygen; oxidation; surfaces; CO; growth; adsorption; crystals
External Publication Status:published
Document Type:Article
Communicated by:Martin Wolf
Affiliations:Fritz-Haber-Institut/Physical Chemistry
External Affiliations:Kim SH (sang-hoon.kim@hitachigst.com), Hitachi Global Storage Technol, San Jose, CA USA; Wintterlin J, Univ Munich, Dept Chem & Biochem, D-81377 Munich; Univ Munich, CeNS, D-81377 Munich, Germany
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