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          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Abt. Dosch/Rühle (Metastable and Low-dimensional Materials)     Display Documents



  history
ID: 43788.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Abt. Dosch/Rühle (Metastable and Low-dimensional Materials)
Temperature-dependent interfacial stiffness of the disorder layer in a thin Cu3Au alloy film
Authors:Ern, C.; Donner, W.; Dosch, H.; Adams, B.; Nowikow, D.
Language:English
Date of Publication (YYYY-MM-DD):2000
Title of Journal:Physical Review Letters
Volume:85
Start Page:1926
End Page:1929
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:Peter Wochner
Affiliations:MPI für Metallforschung/Abt. Dosch
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