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          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Stuttgart Center for Electron Microscopy: StEM     Display Documents



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ID: 458868.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Stuttgart Center for Electron Microscopy: StEM
Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications
Authors:Ratajczak, J.; Łaszcz, A.; Czerwinski, A.; Katcki, J.; Phillipp, F.; van Aken, P. A.; Reckinger, N.; Dupois, E.
Language:English
Date of Publication (YYYY-MM-DD):2010
Title of Journal:Journal of Microscopy
Volume (in Journal):237
Issue / Number:3
Start Page:379
End Page:383
Name of Conference/Meeting:EM 2008 - XIII International Conference on Electron Microscopy
Place of Conference/Meeting:Zakopane, Poland
(Start) Date of Conference/Meeting
 (YYYY-MM-DD):
2008-06-08
End Date of Conference/Meeting 
 (YYYY-MM-DD):
2008-06-11
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Conference-Paper
Communicated by:Fritz Phillipp
Affiliations:MPI für Metallforschung/Stuttgart Center for Electron Microscopy (StEM)
External Affiliations:Institute of Electron Technology, Al. Lotnik´ow 32/46, 02-668 Warsaw, Poland;
Université catholique de Louvain, Place du Levant 3, 1348 Louvain-la-Neuve, Belgium;
IEMN/ISEN, UMRS CNRS 8520, Avenue Poincare, Cite Scientifique, BP 69, 59652 Villeneuve
d’ Ascq Cedex, France.
Identifiers:DOI:10.1111/j.1365-2818.2009.03264.x
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