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          Institute: MPI für Informatik     Collection: Computer Graphics Group     Display Documents



ID: 520477.0, MPI für Informatik / Computer Graphics Group
Feature Sensitive Bas Relief Generation
Authors:Kerber, Jens; Tevs, Art; Zayer, Rhaleb; Belyaev, Alexander; Seidel, Hans-Peter
Language:English
Publisher:IEEE Computer Society Press
Place of Publication:Washington, USA
Date of Publication (YYYY-MM-DD):2009
Title of Proceedings:IEEE International Conference on Shape Modeling and Applications Proceedings
Start Page:148
End Page:154
Place of Conference/Meeting:Beijing, China
(Start) Date of Conference/Meeting
 (YYYY-MM-DD):
2009-06-26
End Date of Conference/Meeting 
 (YYYY-MM-DD):
2009-06-28
Audience:Not Specified
Intended Educational Use:No
Abstract / Description:Among all forms of sculpture, bas-relief is arguably the closest to painting.
Although inherently a two dimensional sculpture, a bas-relief suggests a visual
spatial extension of the scene in depth through the combination of composition,
perspective, and shading. Most recently, there have been significant results on
digital bas-relief generation but many of the existing techniques may wash out
high level surface detail during the compression process. The primary goal of
this work is to address the problem of fine features by tailoring a filtering
technique that achieves good compression without compromising the quality of
surface details. As a secondary application we explore the generation of
artistic relief which mimic cubism in painting and we show how it could be used
for generating Picasso like portraits.
Last Change of the Resource (YYYY-MM-DD):2009-09-21
External Publication Status:published
Document Type:Conference-Paper
Communicated by:Hans-Peter Seidel
Affiliations:MPI für Informatik/Computer Graphics Group
Identifiers:LOCALID:C125675300671F7B-8F2AFB7CFC9176DFC12575F6003BAF29-...
URL:http://www.mpi-inf.mpg.de/~kerber/publications/Jen...
ISBN:978-1-4244-4068-9
Full Text:
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