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Home Search Quick Search Advanced Fulltext Browse Collections Persons My eDoc Session History Login Name: Password: Documentation Help Support Wiki Direct access to document ID:	Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Ehemalige Abt. Arzt (Micro/nanomechanics of Thin Films and Biological Systems)     Display Documents   history ID: 532539.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Ehemalige Abt. Arzt (Micro/nanomechanics of Thin Films and Biological Systems) Near-field lithography by two-photon-induced photocleavage of organic monolayers Authors: Álvarez, M.; Best, A.; Unger, A.; Alonso, J. M.; del Campo, A.; Schmelzeisen, M.; Koynov, K.; Kreiter, M. Language: English Date of Publication (YYYY-MM-DD): 2010-10-15 Title of Journal: Advanced Funktional Functions Volume: 20 Issue / Number: 24 Start Page: 4265 End Page: 4272 Review Status: Peer-review Audience: Experts Only External Publication Status: published Document Type: Article Communicated by: Jutta Hess Affiliations: MPI für Metallforschung/Abt. Arzt MPI für Polymerforschung/AK Spiess External Affiliations: CIC nanoGUNE Consolider, San Sebastián, Spain Identifiers: DOI:10.1002/adfm.201000939 The scope and number of records on eDoc is subject to the collection policies defined by each institute - see "info" button in the collection browse view.