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          Institute: MPI für Plasmaphysik     Collection: Articles, Books, Inbooks     Display Documents



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ID: 535382.0, MPI für Plasmaphysik / Articles, Books, Inbooks
Layer Morphology Analysis of Sputter-eroded Silicon Gratings using Rutherford Backscattering
Authors:Langhuth, H.; Mayer, M.; Lindig, S.
Language:English
Date of Publication (YYYY-MM-DD):2011
Title of Journal:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Volume:269
Issue / Number:16
Start Page:1811
End Page:1817
Copyright:Elsevier
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Plasmaphysik/Material Research (MF)
Identifiers:DOI:10.1016/j.nimb.2011.05.002
URL:http://www.sciencedirect.com/science/article/pii/S...
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