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ID:
574220.0,
MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Emeriti and Others |
Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling |
Authors: | Wang, J. Y.; Liu, Y.; Hofmann, S.; Kovac, J. | Language: | English | Date of Publication (YYYY-MM-DD): | 2011 | Title of Journal: | Surface and Interface Analysis | Volume: | 44 | Start Page: | 569 | End Page: | 572 | Title of Issue: | 5 | Review Status: | Peer-review | Audience: | Experts Only | External Publication Status: | published | Document Type: | Article |
Communicated by: | Heide Klooz | Affiliations: | MPI für Intelligente Systeme/Emeriti and Others
| External Affiliations: | Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong, China;
Department of Surface Engineering and Optoelectronics F4, Jozef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia
| Identifiers: | DOI:10.1002/sia.3855 | |
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