Home News About Us Contact Contributors Disclaimer Privacy Policy Help FAQ

Home
Search
Quick Search
Advanced
Fulltext
Browse
Collections
Persons
My eDoc
Session History
Login
Name:
Password:
Documentation
Help
Support Wiki
Direct access to
document ID:


          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Abt. Spatz (New Materials and Biosystems)     Display Documents



  history
ID: 575724.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Abt. Spatz (New Materials and Biosystems)
Antireflective subwavelength structures on microlens arrays—comparison of various manufacturing techniques
Authors:Pacholski, Claudia; Morhard, Christoph; Spatz, Joachim P.; Lehr, Dennis; Schulze, Marcel; Kley, Ernst-Bernhard; Tünnermann, Andreas; Helgert, Michael; Sundermann, Michael; Brunner, Robert
Language:English
Date of Publication (YYYY-MM-DD):2012
Title of Journal:Applied Optics
Volume:51
Issue / Number:1
Start Page:8
End Page:14
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:Elisabeth Pfeilmeyer
Affiliations:MPI für Intelligente Systeme/Abt. Spatz
External Affiliations:Biophysikalische Chemie, Universität Heidelberg. INF 253, 69120 Heidelberg;
Friedrich-Schiller-Universität Jena, 07743 Jena;
Carl Zeiss Jena GmbH, Technologie Zentrum, 07745 Jena;
Carl Zeiss Jena GmbH, Technologie Zentrum, 73447 Oberkochen;
FH Jena, 07745 Jena
Identifiers:DOI:10.1364/AO.51.000008
The scope and number of records on eDoc is subject to the collection policies defined by each institute - see "info" button in the collection browse view.