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          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Abt. Schütz (Modern Magnetic Systems)     Display Documents



  history
ID: 618623.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Abt. Schütz (Modern Magnetic Systems)
Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes
Authors:Nadzeyka, A.; Peto, L.; Bauerdick, S.; Mayer, M.; Keskinbora, K.; Grévent, C.; Weigand, M.; Hirscher, M.; Schütz, G.
Language:English
Date of Publication (YYYY-MM-DD):2012
Title of Journal:Microelectronic Engineering
Volume:98
Start Page:198
End Page:201
Title of Issue:Special Issue: Micro- and Nano-Engineering (MNE) Sept. 19-23, 2011, Berlin, selected contributions: Part II
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:Michael Hirscher
Affiliations:MPI für Intelligente Systeme/Abt. Schütz
External Affiliations:Raith GmbH, Dortmund 44263, Germany
Identifiers:DOI:10.1016/j.mee.2012.07.036
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