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          Institute: MPI für Plasmaphysik     Collection: Conference Papers     Display Documents



ID: 630832.0, MPI für Plasmaphysik / Conference Papers
Surface Mechanism during Growth of a-Si:H Films from Low Temperature Plasmas
Authors:Keudell, A. von
Language:English
Date of Publication (YYYY-MM-DD):1999
Title of Proceedings:14th International Symposium on Plasma Chemistry
Start Page:1263
End Page:1265
Volume (in Series):3
Name of Conference/Meeting:14th International Symposium on Plasma Chemistry
Place of Conference/Meeting:Prague (CZ)
(Start) Date of Conference/Meeting
 (YYYY-MM-DD):
1999-08-02
End Date of Conference/Meeting 
 (YYYY-MM-DD):
1999-08-06
Review Status:Peer-review
Audience:Not Specified
External Publication Status:published
Document Type:Conference-Paper
Communicated by:N. N.
Affiliations:MPI für Plasmaphysik/Surface Science
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