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          Institute: MPI für Plasmaphysik     Collection: Articles, Books, Inbooks     Display Documents



  history
ID: 657903.0, MPI für Plasmaphysik / Articles, Books, Inbooks
Low energy helium implantation in evaporated nickel surfaces
Authors:Nygren, R. E.; Doyle, B. L.; Walsh, D. S.; Ottenberger, W.; Brooks, J. N.; Krauss, A.
Language:English
Research Context:10th International Conference on Plasma-Surface Interactions in Controlled Fusion Devices (PSI-10), Montery, CA, 1992-03-30 to 1992-04-03
Date of Publication (YYYY-MM-DD):1992
Title of Journal:Journal of Nuclear Materials
Volume:196
Start Page:558
End Page:563
Review Status:Peer-review
Audience:Experts Only
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Plasmaphysik
Identifiers:DOI:10.1016/S0022-3115(06)80098-X
URL:http://www.sciencedirect.com/science/article/pii/S...
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