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          Institute: MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung)     Collection: Ehemalige Abt. Rühle (Microstructure and Interfaces)     Display Documents



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ID: 6818.0, MPI für Intelligente Systeme (ehemals Max-Planck-Institut für Metallforschung) / Ehemalige Abt. Rühle (Microstructure and Interfaces)
Electron-irradiation-induced amorphization in Mo/Si nano- multilayer material
Authors:Shioya, E.; Suda, T.; Watanabe, S.; Ohnuki, S.; Ishino, M.; Yoda, O.; Abe, H.; Phillipp, F.
Language:English
Date of Publication (YYYY-MM-DD):2002-04
Title of Journal:Materials Transactions
Journal Abbrev.:Mater. Trans.
Volume:43
Issue / Number:4
Start Page:650
End Page:653
Review Status:Peer-review
Audience:Experts Only
Free Keywords:66-ru_2002;
multilayer; interface; electron-irradiation; amorphization; high-resolution electron microscope
External Publication Status:published
Document Type:Article
Affiliations:MPI für Metallforschung/Abt. Rühle/ZWE Hochspannungs-Mikroskopie
External Affiliations:Hokkaido Univ, Grad Sch Engn, Mat Sci Div, Sapporo, Hokkaido 0608628, Japan; Japan Atom Energy Res Inst, Kansai Res Estab, Kizu 6190215, Japan; Japan Atom Energy Res Inst, Takasaki Res Estab, Takasaki, Gumma 3701292, Japan; Japan Atom Energy Res Inst, Takasaki Res Estab, D-70569 Stuttgart, Germany;
Identifiers:ISI:000175971900010
ISSN:1345-9678
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