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Crystal Growth and Real Structure Effects of the First Weak 3D Stacked Topological Insulator Bi14Rh3I9
Authors: Rasche, B.; Isaeva, A.; Gerisch, A.; Kaiser, M.; Van den Broek, W.; Koch, C. T.; Kaiser, U.; Ruck, M.
Date of Publication (YYYY-MM-DD): 2013-06-11
Title of Journal: Chemistry of Materials
Volume: 25
Issue / Number: 11
Start Page: 2359
End Page: 2364
Document Type: Article
ID: 668948.0
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