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SOI planar photonic crystal fabrication: Etching through SiO2/Si/SiO2 layer systems using fluorocarbon plasmas
Authors: Milenin, A.P.; Jamois, C.; Geppert, T.M.; G”ösele, U.; Wehrspohn, R.B.
Date of Publication (YYYY-MM-DD): 2005
Title of Journal: Microelectronic Engineering
Volume: 81
Issue / Number: 1
Start Page: 15
End Page: 21
Document Type: Article
ID: 275289.0
The SOI planar photonic crystal fabrication: Patterning of Cr using Cl2/O2 plasma etching
Authors: Milenin, A.P.; Jamois, C.; Wehrspohn, R.B.; Reiche, M.
Date of Publication (YYYY-MM-DD): 2005
Title of Journal: Microelectronic Engineering.
Volume: 77
Issue / Number: 2
Start Page: 139
End Page: 143
Document Type: Article
ID: 275290.0
Entries: 1-2  
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