Kou, L. Z., B. H. Yan, F. M. Hu, S. C. Wu, T. O. Wehling, C. Felser, C. F. Chen and T. Frauenheim: Graphene-Based Topological Insulator with an Intrinsic Bulk Band Gap above Room Temperature. In: Nano Letters 13, 12, 6251-6255 (2013).
doi: 10.1021/nl4037214
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