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Entries: 1-3  
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Potassium Sorbate Solutions as Copper Chemical Mechanical Planarization (CMP) Based Slurries
Authors: Abelev, E.; Smith, A. J.; Hassel, A. W.; Ein-Eli, Y.
Date of Publication (YYYY-MM-DD): 2007
Title of Journal: Electrochim. Acta
Volume: 52
Start Page: 5150
End Page: 5158
Document Type: Article
ID: 288965.0
Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP
Authors: Ein-Eli, Y.; Abelev, E.; Smith, A. J.; Hassel, A. W.
(Start) Date of Conference/Meeting
(YYYY-MM-DD): 2006-08-22
Name of Conference/Meeting: 6th International Symposium on Electrochemical Micro & Nanosystem Technologies
Place of Conference/Meeting: Bonn, Germany
Document Type: Talk at Event
ID: 289028.0
Copper Repassivation Characteristics in Carbonate-Based Solutions
Authors: Abelev, E.; Smith, A. J.; Hassel, A. W.; Ein Eli, Y.
Date of Publication (YYYY-MM-DD): 2006
Title of Journal: J. Electrochem. Soc.
Volume: 153
Start Page: B337
End Page: B343
Document Type: Article
ID: 288949.0
Entries: 1-3  
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