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Energy band alignment at TiO2/Si interface with various interlayers
Authors: Perego, M.; Seguini, G.; Scarel, G.; Fanciulli, M.; Wallrapp, F.
Date of Publication (YYYY-MM-DD): 2008-02-15
Title of Journal: Journal of Applied Physics
Volume: 103
Issue / Number: 4
Start Page: [1]
End Page: [6]
Sequence Number of Article: 043509
Document Type: Article
ID: 359178.0
TiO2 and HfO2 in electrolyte-oxide-silicon configuration for applications in bioelectronics
Authors: Wallrapp, F.; Fromherz, P.
Date of Publication (YYYY-MM-DD): 2006-06-01
Title of Journal: Journal of Applied Physics
Volume: 99
Issue / Number: 11
Sequence Number of Article: 114103
Document Type: Article
ID: 287994.0
Entries: 1-2  
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