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Laser-interference lithography tailored for highly symmetrically arranged ZnO nanowire arrays.
Authors: Kim, D. S.; Ji, R.; Fan, H. J.; Bertram, F.; Scholz, R.; Dadgar, R.; Nielsch, K.; Krost, A.; Christen, J.; Gösele, U.; Zacharias, M.
Date of Publication (YYYY-MM-DD): 2007
Title of Journal: Small
Volume: 3
Issue / Number: 1
Start Page: 76
End Page: 80
Document Type: Article
ID: 350499.0
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