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Localized measurement of strains in damascene copper interconnects by convergent-beam electron diffraction
Authors: Nucci, J. A. R.; Keller, R.; Krämer, S.; Volkert, C. A.; Gross, M.
Place of Publication: Warrendale
Publisher: MRS
Date of Publication (YYYY-MM-DD): 2000
Name of Conference/Meeting: Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics
Title of Proceedings: Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics
Start Page: D 851
End Page: D 856
Title of Series: Materials Research Society Symposia Proceedings
Volume (in Series): 612
Document Type: Conference-Paper
ID: 199006.0
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