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Growth of epitaxial Pr2O3 layers on Si(111)
Authors: Jeutter, N. M; Hennemeyer, M.; Stark, R.; Stierle, A.; Moritz, W.
Date of Publication (YYYY-MM-DD): 2006
Title of Journal: Materials Science in Semiconductor Processing
Volume: 9
Start Page: 1079
End Page: 1083
Document Type: Article
ID: 298746.0
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