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Distribution and properties of oxide precipitates in annealed nitrogen doped 300 mm Si wafers
Authors: Akhmetov, V.D.; Richter, H.; Seifert, W.; Lysytskiy, O.; Wahlich, R.; Müller, T.; Reiche, M.
Date of Publication (YYYY-MM-DD): 2004
Title of Journal: European Physical Journal of Applied Physics.
Volume: 27
Issue / Number: 1-3
Start Page: 159
End Page: 161
Document Type: Article
ID: 223994.0
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