von Keudell, A. and J. R. Abelson: Advantages of the 'optical cavity substrate' for real time infrared spectroscopy of plasma-surface interactions. In: Journal of Applied Physics 91, 4840-4845 (2002).
Keudell, A. von and J. R. Abelson: Thermally induced changes in the hydrogen microstructure of amorphous hydrogenated silicon films, analyzed using in situ real time infrared spectroscopy. In: Japanese Journal of Applied Physics. Part 1 38, 7A, 4002-4006 (1999).
doi: 10.1143/JJAP.38.4002
url: http://dx.doi.org/10.1143/JJAP.38.4002
Keudell, A. von and J. R. Abelson: Direct insertion of SiH3 radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films. In: Physical Review B 59, 8, 5791-5798 (1999).
doi: 10.1103/PhysRevB.59.5791
url: http://dx.doi.org/10.1103/PhysRevB.59.5791
Keudell, A. von and J. R. Abelson: The interaction of atomic hydrogen with very thin amorphous hydrogenated silicon films analyzed using in situ real time infrared spectroscopy: Reaction rates and the formation of hydrogen platelets. In: Journal of Applied Physics 84, 1, 489-495 (1998).
doi: 10.1063/1.368082
url: http://dx.doi.org/10.1063/1.368082
http://edoc.mpg.de
The Max Planck Society does not take any responsibility for the content of this export.