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Modeling of altered layer formation during reactive ion etching of GaAs
Authors: Mutzke, A.; Rai, A.; Schneider, R.; Angelin, E.; Hippler, R.
Date of Publication (YYYY-MM-DD): 2012
Title of Journal: Applied Surface Science
Volume: 263
Start Page: 626
End Page: 632
Document Type: Article
ID: 614876.0