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Energy band alignment at TiO2/Si interface with various interlayers
Authors: Perego, M.; Seguini, G.; Scarel, G.; Fanciulli, M.; Wallrapp, F.
Date of Publication (YYYY-MM-DD): 2008-02-15
Title of Journal: Journal of Applied Physics
Volume: 103
Issue / Number: 4
Start Page: [1]
End Page: [6]
Sequence Number of Article: 043509
Document Type: Article
ID: 359178.0


High epitaxial quality Y2O3 high-k dielectric on vicinal Si(001) surfaces
Authors: Apostolopoulos, G.; Vellianitis, G.; Dimoulas, A.; Alexe, M.; Scholz, R.; Fanciulli, M.; Dekadjevi, D.; Wiemer, C.
Date of Publication (YYYY-MM-DD): 2002
Title of Journal: Applied Physics Letters
Volume: 81
Issue / Number: 19
Start Page: 3549
End Page: 3551
Document Type: Article
ID: 33105.0


29Si nuclear magnetic resonance spectra and relaxation in ε-FeSi
Authors: Corti, M.; Fanciulli, M.; Tabak, F.
Date of Publication (YYYY-MM-DD): 2000
Title of Journal: Journal of Applied Physics
Volume: 87
Start Page: 6280
End Page: 6282
Document Type: Article
ID: 181412.0