Matthias, S., F. Müller and U. G”ösele: Controlled nonuniformity in macroporous silicon pore growth. In: Applied Physics Letters 87, 22, 224106/1-224106/3 (2005).
Kim, D., P. Karan, P. G”öring, J. Leclaire, A.-M. Caminade, J.-P. Majoral, U. G”ösele, M. Steinhart and W. Knoll: Dendrimer nanotubes by layer-by-layer deposition. In: Small 1, 1, 99-102 (2005).
Sun, Y., M. Steinhart, D. Zschech, R. Adhikari, G. H. Michler and U. G”ösele: Diameter-dependence of the morphology of PS-b-PMMA nanorods confined within ordered porous alumina templates. In: Macromolecular Rapid Communications 26, 5, 369-375 (2005).
Tan, T. Y. and U. G”ösele: Diffusion in Semiconductors. In: Diffusion in Condensed Matter, Methods, Materials, Models. (Eds.) Heitjans, P. and Kärger, J. Springer-Verlag, Berlin, Germany (2005) 165-208.
Chu, M.-W., I. Szafraniak, D. Hesse, M. Alexe and U. G”ösele: Elastic coupling between 90° twin walls and interfacial dislocations in epitaxial ferroelectric perovskites: A quantitative high-resolution transmission electron microscopy study. In: Physical Review B 72, 17, 174112/1-174112/5 (2005).
Lee, S. K., D. Hesse, M. Alexe, W. Lee, K. Nielsch and U. G”ösele: Growth and characterisation of epitaxial ferroelectric lanthanum substituted bismuth titanate nanostructures with three different orientations. In: Journal of Applied Physics 98, 12, 124302/1-124302/6 (2005).
Tu, K. N. and U. G”ösele: Hollow nanostructures based on the Kirkendall effect: Design and stability considerations. In: Applied Physics Letters 86, 9, 093111/1-093111/3 (2005).
Radu, I., M. Reiche, R. Scholz, D. Webb, U. G”ösele and S. H. Christiansen: Investigation of hydrogen implantation-induced blistering in SiGe. In: Materials Science & Engineering B 124-125, 162-165 (2005).
Zhao, L., M. Steinhart, M. Yosef, S. K. Lee, T. M. Geppert, E. Pippel, R. Scholz, U. G”ösele and S. Schlecht: Lithium niobate microtubes within ordered macroporous silicon by templated thermolysis of a single source precursor. In: Chemistry of Materials 17, 1, 3-5 (2005).
Radu, I., M. Reiche, M. Zoberbier, M. Gabriel and U. G”ösele: Low-temperature wafer bonding via DBD surface activation. In: Proceedings of the International Symposium Semiconductor Wafer Bonding VIII, Science and Technology, and Applications, (Eds.) K. D. Hobart, S. Bengtsson, H. Baumgart, T. Suga, C. E. Hunt. Proceedings volume / Electrochemical Society 2005-02. The Electrochemical Society, Pennington, USA (2005) 295-302.
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