Velasco-Velez, J. J., V. Pfeifer, M. Hävecker, R. Wang, A. Centeno, A. Zurutuza, G. Algara-Siller, E. Stotz, K. Skorupska, D. Teschner, P. Kube, P. Bräuninger-Weimer, S. Hofmann, R. Schlögl and A. Knop-Gericke: Atmospheric pressure X-ray photoelectron spectroscopy apparatus: Bridging the pressure gap. In: Review of Scientific Instruments 87, 5, 1-8, Seq. No.: 053121 (2016).
doi: 10.1063/1.4951724
Hofmann, S.: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science. Springer Series in Surface Sciences 49. Springer-Verlag, Berlin, Heidelberg (2013) XIX,528 S. p.
Eicke, M. J., S. Hofmann, M. P. Elsner, J. Raisch and A. Seidel-Morgenstern: Supersaturation control and optimization of polythermal coupled preferential crystallization. (European Conference on Crystal Growth (ECCG4), 2012-06-17 to 2012-06-20, Glasgow, UK).
Stierle, A., H.-D. Carstanjen and S. Hofmann: Structural and chemical characterization on the nanoscale. In: Nanoelectronics and Information Technology - Advanced Electronic Materials and Novel Devices. (Eds.) Waser, R. Wiley-VCH, Weinheim (2012) 233-254.
Wang, J. Y., S. Liu and S. Hofmann: Influence of nanostationary atomic mixing ondepth resolution in suptter depth profiling. In: Surface and Interface Analytics 44, 560-572 (2012).
doi: 10.1002/SIA.3855
Haettner, E., D. Ackermann, G. Audi, K. Blaum, M. Block, S. Eliseev, T. Fleckenstein, F. Herfurth, F. P. Heßberger, S. Hofmann, J. Ketelaer, J. Ketter, H.-J. Kluge, G. Marx, M. Mazzocco, Y. N. Novikov, W. R. Plaß, S. Rahaman, T. Rauscher, D. Rodríguez, H. Schatz, C. Scheidenberger, L. Schweikhard, B. Sun, P. G. Thirolf, G. Vorobjev, M. Wang and C. Webe: Mass Measurements of Very Neutron-Deficient Mo and Tc Isotopes and Their Impact on rp Process Nucleosynthesis. In: Physical Review Letters 106, 12, 1-5, Seq. No.: 122501 (2011).
doi: 10.1103/PhysRevLett.106.122501
Lejcek, P. and S. Hofmann: Quantitative AES at interfaces. In: Journal of Surface Analysis 17, 241-246 (2011).
Hofmann, S., M. J. Eicke, M. P. Elsner, A. Seidel-Morgenstern and J. Raisch: A Worst-Case observer for impurities in enantioseparation by preferential crystallization. In: 21st European Symposium on Computer Aided Process Engineering - Part A, (Eds.) Pistikopoulos, E.N., Georgiadis, M.C., Kokossis, A.C. Computer-Aided Chemical Engineering 29. Elsevier, Amsterdam (2011) 860-864.
url: http://dx.doi.org/10.1016/B978-0-444-53711-9.50172-3
Bajcinca, N. and S. Hofmann: Optimal control for batch crystallization with size-dependent growth kinetics. In: Proceedings of the American Control Conference, Seq. No.: 5991531 (2011) 2558-2565.
Wang, J. Y., Y. Liu, S. Hofmann and J. Kovac: Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling. In: Surface and Interface Analysis 44, 569-572 (2011).
doi: 10.1002/sia.3855
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