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Atmospheric pressure X-ray photoelectron spectroscopy apparatus: Bridging the pressure gap
Authors: Velasco-Velez, Juan Jesus; Pfeifer, Verena; Hävecker, Michael; Wang, R.; Centeno, A.; Zurutuza, A.; Algara-Siller, G.; Stotz, E.; Skorupska, Katarzyna; Teschner, D.; Kube, P.; Bräuninger-Weimer, P.; Hofmann, S.; Schlögl, Robert; Knop-Gericke, Axel
Date of Publication (YYYY-MM-DD): 2016-06
Title of Journal: Review of Scientific Instruments
Volume: 87
Issue / Number: 5
Start Page: 1
End Page: 8
Sequence Number of Article: 053121
Document Type: Article
ID: 722504.0


Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
Authors: Hofmann, S.
Place of Publication: Berlin, Heidelberg
Publisher: Springer-Verlag
Date of Publication (YYYY-MM-DD): 2013
Physical Description
(e.g. Total Number of Pages):
 XIX,528 S.
Title of Series: Springer Series in Surface Sciences
Volume: 49
Document Type: Book
ID: 627496.0


Supersaturation control and optimization of polythermal coupled preferential crystallization
Authors: Eicke, Matthias J.; Hofmann, S.; Elsner, M. P.; Raisch, Jörg; Seidel-Morgenstern, Andreas
(Start) Date of Conference/Meeting
(YYYY-MM-DD):
 2012-06-17
Name of Conference/Meeting: European Conference on Crystal Growth (ECCG4)
Place of Conference/Meeting: Glasgow, UK
Document Type: Talk at Event
ID: 655791.0


Structural and chemical characterization on the nanoscale
Authors: Stierle, A.; Carstanjen, H.-D.; Hofmann, S.
Title of Book: Nanoelectronics and Information Technology - Advanced Electronic Materials and Novel Devices
Start Page: 233
End Page: 254
Place of Publication: Weinheim
Publisher: Wiley-VCH
Date of Publication (YYYY-MM-DD): 2012
Document Type: InBook
ID: 574221.0


Influence of nanostationary atomic mixing ondepth resolution in suptter depth profiling
Authors: Wang, J. Y.; Liu, S.; Hofmann, S.
Date of Publication (YYYY-MM-DD): 2012
Title of Journal: Surface and Interface Analytics
Volume: 44
Start Page: 560
End Page: 572
Document Type: Article
ID: 627470.0


Mass Measurements of Very Neutron-Deficient Mo and Tc Isotopes
and Their Impact on rp Process Nucleosynthesis
Authors: Haettner, E.; Ackermann, D.; Audi, Georges; Blaum, Klaus; Block, Michael; Eliseev, Sergey; Fleckenstein, T.; Herfurth, Frank; Heßberger, F. P.; Hofmann, S.; Ketelaer, Jens; Ketter, Jochen; Kluge, Hans-Jürgen; Marx, G.; Mazzocco, M.; Novikov, Yuri N.; Plaß, W. R.; Rahaman, S.; Rauscher, T.; Rodríguez, Daniel; Schatz, H.; Scheidenberger, Christoph; Schweikhard, Lutz; Sun, B.; Thirolf, P. G.; Vorobjev, G.; Wang, M.; Webe, C.
Date of Publication (YYYY-MM-DD): 2011-03-21
Title of Journal: Physical Review Letters
Volume: 106
Issue / Number: 12
Start Page: 1
End Page: 5
Sequence Number of Article: 122501
Document Type: Article
ID: 551646.0


Quantitative AES at interfaces
Authors: Lejcek, P.; Hofmann, S.
Date of Publication (YYYY-MM-DD): 2011
Title of Journal: Journal of Surface Analysis
Volume: 17
Start Page: 241
End Page: 246
Document Type: Article
ID: 562960.0


A Worst-Case observer for impurities in enantioseparation by preferential crystallization
Authors: Hofmann, S.; Eicke, M. J.; Elsner, M. P.; Seidel-Morgenstern, A.; Raisch, J.
Place of Publication: Amsterdam
Publisher: Elsevier
Date of Publication (YYYY-MM-DD): 2011
Name of Conference/Meeting: ESCAPE-21 - 21st European Symposium on Computer Aided Process Engineering
Title of Proceedings: 21st European Symposium on Computer Aided Process Engineering - Part A
Start Page: 860
End Page: 864
Title of Series: Computer-Aided Chemical Engineering
Volume (in Series): 29
Document Type: Conference-Paper
ID: 563007.0


Optimal control for batch crystallization with size-dependent growth kinetics
Authors: Bajcinca, N.; Hofmann, S.
Date of Publication (YYYY-MM-DD): 2011
Name of Conference/Meeting: American Control Conference ACC 2011
Title of Proceedings: Proceedings of the American Control Conference
Start Page: 2558
End Page: 2565
Sequence Number: 5991531
Document Type: Conference-Paper
ID: 573812.0


Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling
Authors: Wang, J. Y.; Liu, Y.; Hofmann, S.; Kovac, J.
Date of Publication (YYYY-MM-DD): 2011
Title of Journal: Surface and Interface Analysis
Volume: 44
Start Page: 569
End Page: 572
Document Type: Article
ID: 574220.0