Blankenburg, S., J. M. Cai, P. Ruffieux, R. Jaafar, D. Passerone, X. L. Feng, K. Müllen, R. Fasel and C. A. Pignedoli: Intraribbon Heterojunction Formation in Ultranarrow Graphene Nanoribbons. In: ACS Nano 6, 3, 2020-2025 (2012).
localid: P-12-74
Cai, J. M., P. Ruffieux, R. Jaafar, M. Bieri, T. Braun, S. Blankenburg, M. Muoth, A. P. Seitsonen, M. Saleh, X. L. Feng, K. Müllen and R. Fasel: Atomically precise bottom-up fabrication of graphene nanoribbons. In: Nature 466, 7305, 470-473 (2010).
localid: P-10-288
Ait-Mansour, K., M. E. Canas-Ventura, P. Ruffieux, R. Jaafar, M. Bieri, R. Rieger, K. Müllen, R. Fasel and O. Gröning: Strain-relief pattern as guide for the formation of surface-supported bimolecular nanoribbons. In: Applied Physics Letters 95, 14, Seq. No.: 143111 (2009).
localid: P-09-304
http://edoc.mpg.de
The Max Planck Society does not take any responsibility for the content of this export.