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doi: 10.1103/PhysRevE.87.042404
url: http://link.aps.org/doi/10.1103/PhysRevE.87.042404
Keudell, A. von and J. R. Abelson: Thermally induced changes in the hydrogen microstructure of amorphous hydrogenated silicon films, analyzed using in situ real time infrared spectroscopy. In: Japanese Journal of Applied Physics. Part 1 38, 7A, 4002-4006 (1999).
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url: http://dx.doi.org/10.1143/JJAP.38.4002
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url: http://dx.doi.org/10.1103/PhysRevB.59.5791
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Keudell, A. v.: Surface Mechanism during Growth of a-Si:H Films from Low Temperature Plasmas. In: 14th International Symposium on Plasma Chemistry, (Eds.) M. Hrabovsky / M. Konrad / V. Kopecky. (1999) 1263-1265.
Keudell, A. von and J. R. Abelson: The interaction of atomic hydrogen with very thin amorphous hydrogenated silicon films analyzed using in situ real time infrared spectroscopy: Reaction rates and the formation of hydrogen platelets. In: Journal of Applied Physics 84, 1, 489-495 (1998).
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url: http://dx.doi.org/10.1063/1.368082
Keudell, A. von: Surface reactions during plasma-enhanced chemical vapor deposition of hydrocarbon films. In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 125, 1-4, 323-327 (1997).
doi: 10.1016/S0168-583X(96)00893-2
url: http://www.sciencedirect.com/science/article/pii/S0168583X96008932
Keudell, A. von and W. Jacob: Interaction of hydrogen plasmas with hydrocarbon films, investigated by infrared spectroscopy using an optical cavity substrate. In: Journal of Vacuum Science and Technology A 15, 2, 402-407 (1997).
doi: 10.1116/1.580498
url: http://dx.doi.org/10.1116/1.580498
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doi: 10.1063/1.364184
url: http://jap.aip.org/resource/1/japiau/v81/i3/p1531_s1
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