Nadzeyka, A., L. Peto, S. Bauerdick, M. Mayer, K. Keskinbora, C. Grévent, M. Weigand, M. Hirscher and G. Schütz: Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes. In: Microelectronic Engineering 98, 198-201 (2012).
doi: 10.1016/j.mee.2012.07.036
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