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Self-diffusion of 31Si and 71Ge in relaxed Si0.20Ge0.80 layers
Authors: Laitinen, P.; Strohm, A.; Huikari, J.; Nieminen, A.; Voss, T.; Grodon, C.; Riihimäki, I.; Kummer, M.; Äystö, J.; Dendooven, P.; Räisänen, J.; Frank, W.
Date of Publication (YYYY-MM-DD): 2002-08-19
Title of Journal: Physical Review Letters
Volume: 89
Issue / Number: 8
Sequence Number of Article: 085902
Document Type: Article
ID: 6735.0