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          Document History for Document ID 190255

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Document Version Version Comment Date Status
190255.0 [No comment] 27.03.2008 21:31 Released

ID: 190255.0, MPI für Mikrostrukturphysik / Publikationen des MPI-MSP
Effect of the Si/SiO2 interface on self-diffusion of Si in semiconductor-grade SiO2
Authors:Fukatsu, S.; Takahashi, T.; Itoh, K.M.; Uematsu, M.; Fujiwara, A.; Kageshima, H.; Takahashi, Y.; Shiraishi, K.; Gösele, U.
Date of Publication (YYYY-MM-DD):2003
Title of Journal:Applied Physics Letters.
Volume:83
Start Page:3897
End Page:3899
Review Status:not specified
Audience:Not Specified
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Mikrostrukturphysik