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          Document History for Document ID 275297

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Document Version Version Comment Date Status
275297.0 [No comment] 16.10.2006 11:42 Released

ID: 275297.0, MPI für Mikrostrukturphysik / Publikationen 2005
Interface trap density in amorphous La2Hf2O7/SiO2 high-k gate stacks on Si
Authors:Mereu, B.; Dimoulas, A.; Vellianitis, G.; Apostolopoulos, G.; Scholz, R.; Alexe, M.
Date of Publication (YYYY-MM-DD):2005
Title of Journal:Applied Physics A
Volume:80
Issue / Number:2
Start Page:253
End Page:257
Review Status:not specified
Audience:Not Specified
External Publication Status:published
Document Type:Article
Communicated by:N. N.
Affiliations:MPI für Mikrostrukturphysik