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          Document History for Document ID 430827

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Document Version Version Comment Date Status
430827.0 [No comment] 11.10.2012 10:30 Released

ID: 430827.0, MPI für Eisenforschung GmbH / Microstructure Physics and Metal Forming
Residual stress analysis in chemical-vapor-deposition diamond films
Authors:Liu, T.; Pinto, H.; Brito, P.; Sales, L. A.; Raabe, D.
Language:English
Date of Publication (YYYY-MM-DD):2009-05-20
Title of Journal:Applied Physics Letters
Journal Abbrev.:Appl. Phys. Letters
Volume:94
Issue / Number:20
Sequence Number of Article:201902 (3pp)
Review Status:not specified
Audience:Not Specified
External Publication Status:published
Document Type:Article
Affiliations:MPI für Eisenforschung GmbH
Identifiers:DOI:10.1063/1.3139083
URL:http://link.aip.org/link/?APPLAB/94/201902/1